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Line Edge Roughness of a Latent Image in Post-optical Lithography

Scheme of the Monte Carlo simulation.
(a) Exposure of 75 keV electron beam. (b) Initial distribution of protons (green) and counter anions (red). (c) Latent image formed by proton migration during the acid formation process. The mesh was a 1 nm cube. (d) Initial distribution of acids before PEB. (e) Latent image formed by acid diffusion after PEB. (f) Final latent image formed by proton migration (green) and acid diffusion after PEB (blue).

(a) Correlation between line width and line edge roughness of a latent image for each exposure dose after PEB. (b) through (d) represent the 3D latent image at the minimum LER point for each exposure dose.


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